APS 1104

Coating system, up to 12" Major components: Vacuum chamber/pumping port Electrical cabinet Electrical cabinet Electrical cabinet APS Power division Plasma power supply Polycold High voltage supply Function: Coating chamber of 1104" diameter Materials used: Ta2O5, Nb2O5 and SiO2 (Qty 2) e-beam guns EVQ/14 e-beam gun ESQ212 e-beam gun Leybold advanced plasma source Leybold D65B mechanical pump WRUS 501 second stage mechanical pump Leybold DIP12000 diffusion pump Polycold PFC-1101HC water vapor pumping Auxiliary equipment Plasma cleaning device: APS source Process gas system: Ar, o2, N2 for venting Cooling water system (Qty 2) for whole system, including chamber, e-beam source, APS and all ferro-fluid feed through connections Equipped with optional hot water cooling Cooling water: Pressure, inlet: 5 to 7 bar absolute (73 to 102psig) Temperature inlet: 15ºC to 25ºC Drain: free drain, pressure drop in outlet max. 1.5 bar absolute (22 psi) Warm water: Pressure, inlet: 5 to 7 bar absolute (73 to 102psig) Temperature inlet: 40ºC to 60ºC Drain: free drain, pressure drop in outlet max. 1.5 bar absolute (22 psi) LN2 supply Shutters for (Qty 2) e-beam sources separate, APS source and for substrate Control and visualization LEYBOLD Leycom IV coater control system LEYBOLD compute system, not Microsoft software Main controller Leycom IV for system process control OMS control box to control optical monitoring system 3000 (Optional) APS controller to control APS operation XT/2 controller to control quartz monitoring system Vacuum thin monitoring Residual gas analyzer: no RGA system but (Qty 2) flange type CF4 is available Film thickness monitor: 6-fold quartz monitoring system Optical monitoring system optional 2001 vintage.